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Fiche de : IMHOFF Luc

Département :
Interfaces




Tél. : 03 80 39 61 61
E-mail : luc.imhoff@u-bourgogne.fr

Self-supported Pt-doped ceria nanofilms directly investigated by transmission electron microscopy

Valerie Potin, Nicolas Zanfoni, Luc Imhoff, Pardis Simon, Bruno Domenichini,
Journal : Appl. Surf. Sci. - n° 509 - 2020 - 145177

Photocatalytic properties of atomic layer deposited TiO2 inverse opals and planar films for the degradation of dyes

P. Birnal, M. C. Marco de Lucas, I. Pochard, B. Domenichini, L. Imhoff,
Journal : Appl. Surf. Sci. - n° 512 - 2020 - 145693

Curvature radius measurement by optical profiler and determination of the residual stress in thin films

A. Besnard, M. R. Ardigo, L. Imhoff, P. Jacquet,
Journal : Appl. Surf. Sci. - n° 487 - 2019 - 356-361

Architectured columns with a metal-dielectric periodic nanostructure

Nicolas Martin, Arnaud Cacucci, Valerie Potin, Luc Imhoff, Tomas Nyberg,
Journal : Mater. Lett. - n° 172 - 2016 - 128-131

Direct liquid injection chemical vapor deposition of platinum doped cerium oxide thin films

N. Zanfoni, L. Avril, L. Imhoff, B. Domenichini, S. Bourgeois,
Journal : Thin Solid Films - n° 589 - 2015 - 246-251

Nanostructured Pt-TiO2 composite thin films obtained by direct liquid injection metal organic chemical vapor deposition: Control of chemical state by X-ray photoelectron spectroscopy

L. Avril, S. Bourgeois, P. Simon, B. Domenichini, N. Zanfoni, F. Herbst, L. Imhoff,
Journal : Thin Solid Films - n° 591 - 2015 - 237-244

MOCVD growth of porous cerium oxide thin films on silicon substrate

L. Avril, N. Zanfoni, P. Simon, L. Imhoff, S. Bourgeois, B. Domenichini,
Journal : Surf. Coat. Technol. - n° 280 - 2015 - 148-153

Thermal stability of Au-TiO2 nanocomposite films prepared by direct liquid injection CVD

L. Avril, S. Bourgeois, M. C. Marco de Lucas, B. Domenichini, P. Simon, F. Addou, J. Boudon, V. Potin, L. Imhoff,
Journal : Vacuum - n° 122 - 2015 - 314-320

TiO2 anatase films obtained by direct liquid injection atomic layer deposition at low temperature

L. Avril, S. Reymond-Laruinaz, J. M. Decams, S. Bruyere, V. Potin, M. C. Marco de Lucas, L. Imhoff,
Journal : Appl. Surf. Sci. - n° 288 - 2014 - 201-207

Structural and electrical properties in tungsten/tungsten oxide multilayers

Arnaud Cacucci, Valerie Potin, Luc Imhoff, Nicolas Martin,
Journal : Thin Solid Films - n° 553 - 2014 - 93-97

Flash annealing influence on structural and electrical properties of TiO2/TiO/Ti periodic multilayers

Arnaud Cacucci, Olivier Heintz, Ioannis Tsiaoussis, Ludovic Avril, Valerie Potin, Luc Imhoff, Nicolas Martin,
Journal : Thin Solid Films - n° 553 - 2014 - 47-51

Alumina particle reinforced TiO2 composite films grown by direct liquid injection MOCVD

L. Avril, J. Boudon, M. C. Marco de Lucas, L. Imhoff,
Journal : Vacuum - n° 107 - 2014 - 259-263

Redox reactions in the Pt/TiO2-WO3/SiO2 planar system

J. Nazon, L. Imhoff, B. Domenichini, Z. Li, M. Chorro, S. Bourgeois,
Journal : Vacuum - n° 107 - 2014 - 247-253

Growth of WC-Cr-N and WC-Al-N coatings in a RF-magnetron sputtering process

Andrei V. Stanishevsky, Michael J. Walock, Yujiao Zou, Luc Imhoff, Amel Zairi, Corinne Nouveau,
Journal : Vacuum - n° 90 - 2013 - 129-134

The interdependence of structural and electrical properties in TiO2/TiO/Ti periodic multilayers

Arnaud Cacucci, Ioannis Tsiaoussis, Valerie Potin, Luc Imhoff, Nicolas Martin, Tomas Nyberg,
Journal : Acta Mater. - n° 61 - 2013 - 4215-4225

Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers

Arnaud Cacucci, Stephane Loffredo, Valerie Potin, Luc Imhoff, Nicolas Martin,
Journal : Surf. Coat. Technol. - n° 227 - 2013 - 38-41

Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process

A. Cacucci, V. Potin, L. Imhoff, M. C. Marco de Lucas, N. Martin,
Journal : Thin Solid Films - n° 520 - 2012 - 4778-4781

Sputtered Tungsten-Based Ternary and Quaternary Layers for Nanocrystalline Diamond Deposition

Michael J. Walock, Issam Rahil, Yujiao Zou, Luc Imhoff, Shane A. Catledge, Corinne Nouveau, Andrei V. Stanishevsky,
Journal : J. Nanosci. Nanotechnol. - n° 12 - 2012 - 4825-4831

Photoemission study of the reactivity of barium towards SiOx thermal films

T. Geneves, B. Domenichini, L. Imhoff, V. Potin, Z. Li, S. Bourgeois,
Journal : Surf. Sci. - n° 605 - 2011 - 1704-1710

Structure and chemical bonds in reactively sputtered black Ti-C-N-O thin films

J. M. Chappe, M. C. Marco de Lucas, L. Cunha, C. Moura, J. F. Pierson, L. Imhoff, O. Heintz, V. Potin, S. Bourgeois, F. Vaz,
Journal : Thin Solid Films - n° 520 - 2011 - 144-151

CVD elaboration and in situ characterization of barium silicate thin films

Thomas Geneves, Luc Imhoff, Bruno Domenichini, Paul Maurice Peterle, Sylvie Bourgeois,
Journal : J. Eur. Ceram. Soc. - n° 30 - 2010 - 441-446

Physical and Mechanical Properties of CrAlN and CrSiN Ternary Systems for Wood Machining Applications

Yacine Benlatreche, Corinne Nouveau, Hamid Aknouche, Luc Imhoff, Nicolas Martin, Joseph Gavoille, Christophe Rousselot, Jean-Yves Rauch, David Pilloud,
Journal : Plasma Process. Polym. - n° 6 - 2009 -

Coexistence of several structural phases in MOCVD TiO2 layers: evolution from nanometre to micrometre thick films

A. Brevet, M. C. Marco de Lucas, V. Potin, R. Chassagnon, L. Imhoff, B. Domenichini, S. Bourgeois,
Journal : J. Phys. D-Appl. Phys. - n° 42 - 2009 - 175302

Structural and electrical properties of magnetron sputtered Ti(ON) thin films: The case of TiN doped in situ with oxygen

A. Trenczek-Zajac, M. Radecka, K. Zakrzewska, A. Brudnik, E. Kusior, S. Bourgeois, M. C. Marco de Lucas, L. Imhoff,
Journal : J. Power Sources - n° 194 - 2009 - 93-103

Elaboration and characterization of barium silicate thin films

T. Geneves, B. Domenichini, L. Imhoff, V. Potin, O. Heintz, P. M. Peterle, S. Bourgeois,
Journal : Micron - n° 39 - 2008 - 1145-1148

Development of dark Ti(C,O,N) coatings prepared by reactive sputtering

J. M. Chappe, F. Vaz, L. Cunha, C. Moura, M. C. Marco De Lucas, L. Imhoff, S. Bourgeois, J. F. Pierson,
Journal : Surf. Coat. Technol. - n° 203 - 2008 - 804-807

Angle resolved X-ray photoemission spectroscopy double layer model for in situ characterization of metal organic chemical vapour deposition nanometric films

A. Brevet, L. Imhoff, M. C. Marco de Lucas, B. Domenichini, S. Bourgeois,
Journal : Thin Solid Films - n° 515 - 2007 - 6407-6410

Pulsed laser growth and characterization of thin films on titanium substrates

L. Lavisse, J. M. Jouvard, L. Imhoff, O. Heintz, J. Korntheuer, C. Langlade, S. Bourgeois, M. C. Marco de Lucas,
Journal : Appl. Surf. Sci. - n° 253 - 2007 - 8226-8230

Interfacial reaction during MOCVD growth revealed by in situ ARXPS

A Brevet, R Chassagnon, L Imhoff, MCM de Lucas, B Domenichini, S Bourgeois,
Journal : Surf. Interface Anal. - n° 38 - 2006 - 579-582

Dynamics of molybdenum nano structure formation on the TiO2(110) surface: A kinetic Monte Carlo approach

G. Le Saux, P. Kruger, B. Domenichini, L. Imhoff, S. Bourgeois,
Journal : Appl. Surf. Sci. - n° 252 - 2006 - 5399-5402

Phase mixture in MOCVD and reactive sputtering TiOxNy thin films revealed and quantified by XPS factorial analysis

Jerome Guillot, Jean-Marie Chappe, Olivier Heintz, Nicolas Martin, Luc Imhoff, Jamal Takadoum,
Journal : Acta Mater. - n° 54 - 2006 - 3067-3074

Surface preparation influence on the initial stages of MOCVD growth of TiO2 thin films

A. Monoy, A. Brevet, L. Imhoff, B. Domenichini, E. Lesniewska, P. M. Peterle, M. C. Marco de Lucas, S. Bourgeois,
Journal : Thin Solid Films - n° 515 - 2006 - 687-690

Chemical characterization of gallium droplets grown by LP-MOCVD

L. Imhoff, O. Heintz, V. Gauthier, C. Marco de Lucas, S. Bourgeois,
Journal : Appl. Surf. Sci. - n° 253 - 2006 - 2820-2824

Initial stages of TiO2 thin films MOCVD growth studied by in situ surface analyses

A. Brevet, P. M. Peterle, L. Imhoff, M. C. Marco de Lucas, S. Bourgeois,
Journal : J. Cryst. Growth - n° 275 - 2005 -

Structure and properties of GaNxOy films grown by nitridation of GaAs(100) substrates

MCM de Lucas, F Fabreguette, M Linsavanh, L Imhoff, O Heintz, C Josse-Courty, MT Mesnier, V Potin, S Bourgeois, M Sacilotti,
Journal : J. Cryst. Growth - n° 261 - 2004 - 324-329

MOVPE growth of Ga 3D structures for fabrication of GaN materials

M Sacilotti, L Imhoff, S Bourgeois, C Dumas, J Decobert, P Baldeck, I Colombier,
Journal : J. Cryst. Growth - n° 261 - 2004 - 253-258

Optical properties of novel GaN 3D structures grown by metal-organic chemical vapor deposition (MOCVD)

M Sacilotti, L Imhoff, C Dumas, P Viste, JC Vial, P Baldeck, I Colombier, F Donatini,
Journal : Jpn. J. Appl. Phys. Part 2 - Lett. Express Lett. - n° 43 - 2004 -

Structural characterization of TiO2/TiNxOy (delta-doping) heterostructures on (110)TiO2 substrates

T Chiaramonte, LP Cardoso, RV Gelamo, F Fabreguette, M Sacilotti, MCM de Lucas, L Imhoff, S Bourgeois, Y Kihn, MJ Casanove,
Journal : Appl. Surf. Sci. - n° 212 - 2003 - 661-666

Thermal effects on the growth by metal organic chemical vapour deposition of TiO2 thin films on (100) GaAs substrates

A Brevet, F Fabreguette, L Imhoff, MCM de Lucas, O Heintz, L Saviot, M Sacilotti, S Bourgeois,
Journal : Surf. Coat. Technol. - n° 151 - 2002 - 36-41

Nitrogen plasma pressure influence on the composition of TiNxOy sputtered films

J Guillot, A Jouaiti, L Imhoff, B Domenichini, O Heintz, S Zerkout, A Mosser, S Bourgeois,
Journal : Surf. Interface Anal. - n° 33 - 2002 - 577-582

Structural and in depth characterization of newly designed conducting/insulating TiNxOy/TiO2 multilayers obtained by one step LP-MOCVD growth

F Fabreguette, L Imhoff, O Heintz, M Maglione, B Domenichini, MCM de Lucas, P Sibillot, S Bourgeois, M Sacilotti,
Journal : Appl. Surf. Sci. - n° 175 - 2001 - 685-690

Conductimetry and impedance spectroscopy study of low pressure metal organic chemical vapor deposition TiNxOy films as a function of the growth temperature: a percolation approach

F Fabreguette, M Maglione, L Imhoff, B Domenichini, MCM de Lucas, P Sibillot, S Bourgeois, M Sacilotti,
Journal : Appl. Surf. Sci. - n° 175 - 2001 - 574-578

Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS

J Guillot, F Fabreguette, L Imhoff, O Heintz, MCM de Lucas, M Sacilotti, B Domenichini, S Bourgeois,
Journal : Appl. Surf. Sci. - n° 177 - 2001 - 268-272

Structural characterization of TiNxOy/TiO2 single crystalline and nanometric multilayers grown by LP-MOCVD on (110)TiO2

F Fabreguette, J Guillot, LP Cardoso, R Marcon, L Imhoff, MCM de Lucas, R Sibillot, S Bourgeois, P Dufour, M Sacilotti,
Journal : Thin Solid Films - n° 400 - 2001 - 125-129

Temperature and substrate influence on the structure of TiNxOy thin films grown by low pressure metal organic chemical vapour deposition

F Fabreguette, L Imhoff, J Guillot, B Domenichini, MC de Lucas, P Sibillot, S Bourgeois, M Sacilotti,
Journal : Surf. Coat. Technol. - n° 125 - 2000 - 396-399

Correlation between the electrical properties and morphology of low-pressure MOCVD titanium oxynitride thin films grown at various temperatures

F Fabreguette, L Imhoff, M Maglione, B Domenichini, MCM de Lucas, P Sibillot, S Bourgeois, M Sacilotti,
Journal : Chem. Vapor Depos. - n° 6 - 2000 - 109-114

Evaluation and localization of oxygen in thin TiN layers obtained by RTLPCVD from TiCl4-NH3-H-2

L Imhoff, A Bouteville, H de Baynast, JC Remy,
Journal : Solid-State Electron. - n° 43 - 1999 - 1025-1029

Composition and tribological characterization of chemically vapour-deposited TiN layer

L Fouilland, L Imhoff, A Bouteville, S Benayoun, JC Remy, J Perriere, M Morcrette,
Journal : Surf. Coat. Technol. - n° 100 - 1998 - 146-148

Kinetics of the formation of titanium nitride layers by rapid thermal low pressure chemical vapor deposition from TiCl4-NH3-H-2

L Imhoff, A Bouteville, JC Remy,
Journal : J. Electrochem. Soc. - n° 145 - 1998 - 1672-1677

Low temperature rapid thermal low pressure chemical vapor deposition of [111] oriented TiN layers from the TiCl4-NH3-H-2 gaseous phase

A Bouteville, L Imhoff, JC Remy,
Journal : Microelectron. Eng. - n° - 1997 - 421-425

Thermodynamics of the formation of TiN from TiCl4-NH3-H-2 on a patterned oxidized silicon substrate

A Bouteville, L Imhoff, JC Remy,
Journal : J. Electrochem. Soc. - n° 143 - 1996 - 3251-3256
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